Magnetron Sputtering Machine

See Larger Picture : Magnetron Sputtering Machine

Company Name:Shanghai Asin Optical Materials Co., Ltd
Membership:Free Member
Member Since:2017. 02.19
Country/Region:China
City:Shanghai
Contact:Bob Jang
Related Keywords:Magnetron, Sputtering

Share to :

Contact Now* Send an Inquiry to this supplier.

Start Order * Name your price

Browse by Category

You may also be intersted in: electron beamalloyhydroxyapatiteal2o3ceramicprocessing partsfilterbearingevaporationmelted quartz blockflangemetal sinteringsio2evaporator

Shanghai Asin Optical Materials Co., Ltd
[China]

Address: Jiading district ,Shanghai 201818, China Shanghai Shanghai

Phone: 86-21-6545668

Contact name: Bob Jang

Report Item

Product Details

Quick Information

Place of Origin: China

Description

Main technical indexes:
1. ultimate vacuum: ≤6.6X10³Pa
2. vacuum acquisition system adopts molecular pump + mechanical pump unit
3. continuous pumping for 30 minutes, the vacuum degree is less than or equal to 8x10³Pa
4. cylindrical sputtering targets can work independently or at the same time
The
5. substrate ≤60mm in diameter, can be heated to ≤700℃, with water cooling, substrate speed adjustable, adjustable target base moment

Component	Composition and specifications
Vacuum chamber	Number	Single chamber
	Material	304 stainless steel
	Form	Cylindrical vertical structure
	Dimension	Φ300XH250
	Top seal	Fluorine rubber seal
	Nozzle	Contains two vacuum gauge interface, several magnetron sputtering target interface, a high vacuum valve interface, a drainage pipe interface, an observation window interface, three valve interface, three interface and operating mechanism of two electrical interface introduction.
	Opening mode	Top cover lifting device without top lifting
	Lighting / drying	1x1000W lighting lamp, 1x1000w halogen lamp drying, drying temperature within 200℃
Vacuum pumping systems	main pump	Molecular pump 1pc
	forepump	6L rotary vane mechanical pump
	backing pump	6L rotary vane mechanical pump
	valve	High vacuum valve adopts ultrahigh vacuum 1pc, bleed valve adopts ultrahigh vacuum stop valve three
	Pipe / joint	Precision stainless steel tube, composed of bellows, quick unload street and double card sleeve joint
Vacuum Measuring System	Compound vacuum gauge, gauge adopts all metal bare gauge
Magnetron Sputtering System	Magnetron sputtering source	One or two R60 magnetron sputtering targets
	Target mounting position	Vacuum chamber plate
	Power Supply	DC0.5KW,RF0.5KW each 1pc
	target size	Round copper target Φ60x2pcs
	Baffle operation	Direct shaft 1pc
Substrate system	Substrate size / quantity	Φ≤60mm，1pc
	Substrate rotation	autoroatation, speed 0-120/minute
	Target base torque	10cm, is adjustable (±5cm)
	Substrate heating	Can be heated below 700℃, with water cooling
	temperature control	PID control, the control accuracy ±1℃
Water cooling system	cooling of target	With a cooling water pipe and no cooling water or insufficient cooling water pressure, the water pressure relay is disconnected and the target power supply is cut off so as to prevent the target from overheating
	Vacuum cooling system	Molecular pump cooling
	Substrate cooling	Cooling water cooling
Gas delivery system	Conveying mode	gas pipeline and the charging valve are passed through the vacuum chamber wall
Gas delivery system	Gas control	MFC mass flow controller
Frame	structure	Aluminum frame

Product Image

Buyer	Transaction Information	Feed Back
No Data.

Other products from this supplier

Send an Inquiry to this supplier

Send an Inquiry to this supplier
* From
To	Bob Jang Shanghai Asin Optical Materials Co., Ltd
* Buying Product	- Please enter your specific buying item. e.g. 42 inch LCD TV, leather executive chair Category : Glass Processing Machinery
* Message	Use English only Max. 2000 characters. (Min. 20) Send
EC21.com does not guarantee the validity of product information or the credentials of sellers.